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Mattson Technology’s Plasma Etch Products Delivering Unique Plasma Source Technology Over 100 ICP Etch Systems in High Volume Production Leader in Dry Strip Market and Surface Cleaning Industry Benchmark in Photoresist Removal Purest High Density Radical Source Millios Most Flexible Millisecond Anneal & Silicidation Tool Brightest Man-Made Light Source on Earth ® Helios  Product Family Leading Double-Sided Heating Solution Best Pattern Loading Performance ® in Rapid Thermal Processing Unique ATOMIC SURFACE ENGINEERING  Solutions

About Us

We design, manufacture, market and globally support semiconductor wafer processing equipment used in the fabrication of integrated circuits.

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Technology

Our manufacturing equipment for Dry Strip, Plasma Etch, Surface Treatment and Ultra-Selective Materials Removal, Rapid Thermal Processing and Millisecond Anneal utilizes innovative technologies to deliver advanced processing capabilities and high productivity for the fabrication of current and next-generation integrated circuits.

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Contact Us

Headquartered in Silicon Valley, we maintain a global infrastructure to meet the needs of our diverse customer base.

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Contact Us

We have our roots in Silicon Valley.

Corporate Headquarters

47131 Bayside Pkwy.
Fremont, CA 94538
510-657-5900
info@mattson.com

Worldwide Locations

Additional Contact Information:

Parts Support:
510-492-6300
partsupport@mattson.com

Technical Support:
thermaltechsupport@mattson.com
plasmaproductstechsupport@mattson.com